physical vapor deposition meaning in English
pvd
磷酸盐皮膜处理
物理气相沉积
物理汽相淀积
物理蒸镀
Examples
- The refractory metals and refractory metal silicides that are used to augment or replace the polysilicon are generally deposited by physical vapor deposition processes .
用于增强和取代多晶硅的难熔金属和难熔金属硅化物通常是用物理蒸发沉积工艺沉积的。 - Physical vapor deposition
物理蒸汽沉淀法 - Physical vapor deposition
物理蒸镀 - Abstract : the deposited film with magnesium / polytetrafluoroethylene ( mg / ptfe ) material is produced by physical vapor deposition . the infrared radiation property of mg / ptfe material is tested by using the infrared radiation meter . the results demonstrated that this material has stronger infrared radiation in 1 3 m wave length . it shows that produced infrared radiation pyrotechnic material by physical vapor deposition is feasible
文摘:采用物理汽相沉积法设计制作了镁/聚四氟乙烯沉积膜材料，并用红外辐射计对其红外辐射性能进行了测试，测得该材料在1 3 m波段有较强的红外辐射，说明这种方法制作红外辐射烟火材料是可行的。 - Rf magnetron sputtering that has been broadly used to fabricate a variety of thin films is a kind of physical vapor deposition ( pvd ) , which consists of two main microscopic processes , one is the generation and transportation of the vapor phase particles to form the thin film , the other is the diffusion and aggregation of the film atoms on substrate , which leads to the formation of the film
射频磁控溅射是一种物理气相沉积技术，已被广泛地用于各种薄膜的制备。它主要包括成膜气相粒子(原子或分子)的产生和输运以及输运到衬底的成膜粒子在衬底上的扩散、聚集、生长成膜两大过程。